Ilmanpuhdistin Sharp UA-HD40E-L tiloihin enintään 26 m², 216 m³/h, 47 dB, 25 W, harmaa, 7,9 kg

Plasmacluster Ion Technology emits positive and negative ions that act on airborne and surface contaminants. The technology helps reduce bacteria, viruses, allergens and mold particles, neutralize odors and decrease static electricity while contributing to improved skin moisture.

Advantages

Plasmacluster Ion Technology provides continuous ion emission for broad-spectrum reduction of microorganisms and allergens. It neutralizes odors without adding fragrances and reduces static electricity on materials. The process can also support skin moisture by altering airborne conditions.

Key specifications

How to use

Operate the device according to the manufacturer's instructions to enable continuous Plasmacluster ion emission. Place the unit in the area where air cleaning and odor reduction are desired, ensuring unobstructed airflow around the device. Maintain regular cleaning and follow service intervals recommended by the device manual to preserve performance.

Recommendations

Use Plasmacluster Ion Technology as a complementary measure to regular cleaning and ventilation. For best results, combine with routine surface cleaning and proper humidity control.